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The FBI director said that his resignation was the best way to avoid friction. Christopher Babers, the FBI director who decided to resign, explained his decision, saying that it was the best way to avoid further friction against the background of criticism from President-elect Trump who was seeking to appoint his cronies as the head of the intelligence department. The FBI quoted Lei as saying: "My purpose is to continue to focus on our mission-the irreplaceable work we do on behalf of Americans every day. I think this is the best way to avoid getting the FBI involved in more friction. " He added that the decision to resign was not easy for him.OpenAI：Sora has started partial recovery, and OpenAI updated the outage accident report, saying that remedial work is continuing. API traffic recovery is in progress, and we are recovering ChatGPT traffic by region. Sora has begun a partial recovery.Zuckerberg is reported to have donated $1 million to Trump's inauguration fund.

Mizuho listed in Japan to invest in the ETF of Saudi stock market.Zuckerberg is reported to have donated $1 million to Trump's inauguration fund. Zuckerberg's donation is the latest move to strengthen relations with Trump.Pakistan KSE-100 index rose 0.5% to 111,504.90.

Intel: Breakthrough progress has been made in chip interconnection, and the inter-line capacitance has been reduced by 25%. Recently, Intel OEM announced a major breakthrough in on-chip interconnection technology. The latest subtractive Ruthenium interconnection technology of the company can reduce the inter-line capacitance by up to 25%, effectively improving the on-chip interconnection. According to reports, the subtractive ruthenium interconnection technology has achieved great progress in interconnection miniaturization by using ruthenium, a new, key and alternative metallization material, and using thin film resistivity and airgap. This process does not need an expensive photolithographic air gap exclusion zone around the via, and it can also avoid using a self-aligned via that is selectively etched. When the spacing is less than or equal to 25 nm, the air gap realized by reducing ruthenium interconnection technology can reduce the capacitance between lines by up to 25%, which can be used as a metallization scheme to replace copper damascene process in closely spaced layers. It is reported that this solution is expected to be applied in the future process nodes of Intel OEM. (Sina Technology)OPENAI API、CHATGPT、SORA流量基本恢复。Afternoon comments on Hong Kong stocks: Hang Seng Index rose by 1.72%, Hang Seng Technology Index rose by 2.55%, Hong Kong stocks closed at noon, Hang Seng Index rose by 1.72% and Hang Seng Technology Index rose by 2.55%. Chinese brokerage stocks and consumer stocks were among the top gainers, with China Merchants Securities, Mengniu Dairy and Tongcheng Travel up over 7% and over 5% respectively.